The Chisum Patent Academy offers what mainstream Continuing Legal Education (CLE) providers and patent bar review courses simply can’t: premium-quality, rapid-response patent law education and training in a unique seminar-style setting. Co-taught by leading patent law scholars Donald Chisum and Janice Mueller, our intensive two- or three-day seminars are limited to ten (10) participants and conducted in roundtable, interactive style that maximizes opportunities for discussion and debate. We are the antithesis of passive, mega-ballroom CLEs; we welcome those who want to discuss and debate patent law’s nuances and practical strategies. Patent Law Seminar content targets the latest developments from the Federal Circuit and U.S. Supreme Court plus landmark legislation such as the America Invents Act of 2011; we update our syllabus for every seminar. We currently offer seminars at our headquarters in Seattle, Washington; New York City; and Cincinnati, Ohio. We also custom-design seminars to be held on-site at corporations, law firms, and other organizations. Our seminars draw experienced patent practitioners seeking a tune-up on latest developments as well as experienced civil/commercial litigators who are relatively new to patent law. Each two-day seminar typically provides 12.0 CLE credits; each three-day seminar typically provides 18.0 CLE credits.
This is the class that can adapt to anyone working in the field of patent law who wants to expand his horizons.
As an experienced patent practitioner, I am skeptical of CLEs because they typically cover nothing more than what’s generally known. This course was different. It covered topics in great depth and showed me how to use changes in the law to aid my clients.
This was the best CLE program I have ever attended.
You all have created a great format that allows for folks with a wide variety of backgrounds and experience to each come away with a deeper knowledge base to apply in their practices.
I loved the focused, traditionally small class type education; great organization and presentation.
I remained completely mentally engaged during the entirety of all three days, due to the seminar’s more intimate format coupled with the quality of the presentations.
The limited attendance facilitated open discussion and kept me engaged.
The style (especially your willingness to entertain all questions) and limited attendance allowed a type of participation that is absent from most seminars.
Scope and depth were very good — depth was several orders of magnitude beyond any other seminar that I have attended.
I found the scope to be highly relevant–especially recent case law decisions.
You guys do a great job explaining patent law and making it easier to understand.
Format was great–feels like you are part of the discussion instead of being spoken to.
The depth of the topics was exceptional, with the presentation getting into important details that might have been missed otherwise.
This is the first (and I’ll bet only) time I’ve gone to a seminar where I got MCLE credit and wished there was an extra day. Highly recommended.